In this second video Pete Singer, Editor-in-Chief, from Semiconductor Digest interviews Mohamed Saleem, PhD, Chief Technology Officer, Brooks Instrument. Moh

P-Series, high performance mass flow controllers are designed for the most critical process applications where accuracy, repeatability as well as pressure 

The 1640 Pressure-based Mass Flow Controller is a metal-, sealed instrument designed to meter and control gas flows , in low-line pressure applications where thermal mass flow , controllers are limited in their ability to accurately measure , flow. The 1640 utilizes the principle of sonic flow through ,

The pressure-based MFCs are insensitive to fluctuating line pressure, have improved real-time closed-loop control and are characterized in actual process gas.

Brooks Instrument presents the theory of operation behind their pressure-based mass flow controller (P-MFC) from their GP200 series in this video. This P-MFC

A robust product portfolio consisting of SAM and Aera brand analog, digital, and pressure insensitive MFCs provide leading edge Mass Flow Control 

If the MFC valve had a maximum differential pressure limitation of 250 psig, this would work well for operating the reactor at its maximum steady state pressure (1200 psig). However, many research reactors are required to change pressure during the test cycle or they may require the dispensed gas to generate the initial reactor pressurization.

Call 1-888-554-3569 GP200 Series Metal Sealed Pressure-based Mass Flow Controllers All of the performance. None of the limitations. GP200 Series is the first fully pressure-insensitive pressure-based mass flow controller (P-MFC) designed specifically for advanced Etch and Deposition processes in semiconductor manufacturing.

Abstract: A new type of pressure-based MFC has been developed based on a combination of absolute and differential pressure transducers.

Oct 26,  · HATFIELD, Pa. (USA) October 26, - Brooks Instrument, a world leader in advanced flow, pressure, vacuum and vapor delivery solutions, will feature its new GP200 Series pressure-based mass flow controller (P-MFC) at SEMICON Europa, November 16-19, in Munich, Germany. The company will be exhibiting in booth B1572.

The control valve orifice determines the Flow Coefficient for the MFC and is carefully selected by the factory based on the min/max flow rate combined with the min/max Inlet Pressure and the min/max Outlet Pressure specified by the customer at the time of purchase. The Flow Coefficient (i.e. orifice size) is determined by the square root of the